Chromium Sputtering Target Suppliers In India
Chromium Oxide Sputtering Target, Chromium Nitride Sputtering Targets manufacturers
buy Nickel Chromium Sputtering Target at lowest price
Chromium Sputtering Target suppliers in india
Chromium Oxide Sputtering Target
Nickel Chromium Sputtering Target
Are you looking to buy Chromium Oxide Sputtering Target from Chromium Sputtering Target Suppliers In India, Canada, USA, Australia, Canada, UK, Houston, Singapore, South Africa or Indonesia?
Table of Content
Check latest Chromium Sputtering Target price , Chromium Sputtering Target Manufacturer In China, Request a free sample of Chromium Nitride Sputtering Targets
| Molecular Weight | 52 |
|---|---|
| Appearance | Silvery |
| Melting Point | 1857°C |
| Boiling Point | 2672°C |
| Density | 7.18 g/cm3 |
| Solubility in H2O | N/A |
| Electrical Resistivity | 12.9 microhm-cm @ 0°C |
| Electronegativity | 1.6 Paulings |
| Heat of Vaporization | 72.97 K-cal/gm atom at 2672°C |
| Poisson’s Ratio | 0.21 |
| Specific Heat | 0.107 Cal/g/K @ 25°C |
| Tensile Strength | N/A |
| Thermal Conductivity | 0.939 W/cm/K @ 298.2 K |
| Thermal Expansion | (25 °C) 4.9 µm·m-1·K-1 |
| Vickers Hardness | 1060 MN m-2 |
| Young’s Modulus | 279 GPa |
We can supply Nickel Chromium Sputtering Targetto meet customer specific requirements.
|
Product |
Material |
purity |
Various |
Dim. |
|
High purity chromium |
Cr |
3N, 4N |
Sputtering targets |
Various |
|
3N, 4N |
Rod |
Various |
||
|
3N, 4N |
Sheet |
Various |
||
|
3N, 4N |
Granules |
Various |
Chromium Sputtering Target Health & Safety Information
| Signal Word | Warning |
|---|---|
| Hazard Statements | H400 |
| Hazard Codes | N/A |
| Risk Codes | N/A |
| Safety Statements | N/A |
| RTECS Number | GB4200000 |
| Transport Information | N/A |
| WGK Germany | 3 |
|
Chromium Sputtering Target |
Price
|
| Cr sputtering target /chromium sputtering target from China | ₹ 3,553.32-₹ 9,238.64 / Kilogram |
| Chromium sputtering target | ₹ 3,553.32-₹ 10,659.96 / Kilogram |
| High purity Chromium sputtering target, Cr sputtering targets | ₹ 71.07-₹ 7,10,664.00 / Piece |
| High purity Chromium Cr sputtering target 99.98% for Electronic and Semiconductor | ₹ 1,421.33-₹ 17,766.60 / Piece |
| Nickel Chromium Alloy Sputtering Target | ₹ 2,132.00-₹ 5,685.32 / Piece |
| PVD coating materials Polished Grinding high purity chrome Cr chromium sputtering target | ₹ 2,132.00-₹ 3,553.32 / Piece |
| CrCo Plate Chromium Cobalt Alloy Sputtering Target | ₹ 9,949.30-₹ 14,213.28 / Piece |
| HIP rolled Nickel Chromium Sputtering Target for coating film | ₹ 14,213.28-₹ 21,319.92 / Piece |
| pure Cr chromium metal Sputtering Targets for PVD coating | ₹ 3,908.66-₹ 14,213.28 / Kilogram |
| 99.9% Pure Cr Chromium Sputtering Target for Coating Film | ₹ 71.07-₹ 3,553.32 / Piece |
| high purity Chromium sputtering target, Cr sputtering target | ₹ 1,421.33-₹ 7,106.64 / Piece |
Please note this is an approx Chromium Sputtering Target price in India. For final Chromium Cobalt Sputtering Target price list please mail us.
Chromium Aluminum Sputtering Target Suppliers
Chromium Oxide Sputtering Target
Chromium Nitride Sputtering Targets
Nickel Chromium Alloy Sputtering Target
Chromium Cobalt Alloy Sputtering Target
Rotatable Chromium Sputting Target
Chromium Aluminum Sputtering Target
Chromium Trioxide Target
Pvd Chromium Sputtering Target
| CR009300 | Chromium Sputtering Target, Thickness:3.0mm, Purity:99.95% |
| CR009301 | Chromium Sputtering Target, Thickness:3.0mm, Purity:99.9% |
| CR009302 | Chromium Sputtering Target, Thickness:3.0mm, Purity:99.99% |
| CR009500 | Chromium Sputtering Target, Thickness:5.0mm, Purity:99.9%, Condition:Hot Pressed |
| CR009600 | Chromium Sputtering Target, Thickness:6.0mm, Purity:99.95% |
| CR009601 | Chromium Sputtering Target, Thickness:6.0mm, Purity:99.9% |
A leading wholesale dealers & distributor of Chromium Metal Sputtering Targets For Pvd Coating in India offer these Chromium Sputtering Target as per Customer specification. Suppliers & exporter of mill condition High Purity Chromium Sputtering Target for general applications.
Pure metal and alloys sputtering targets
|
Al: Aluminium Target
|
Mo: Molybdenum Target
|
Fe: Iron Target
|
Ti: Titanium Target
|
|
B: Boron Target
|
Nb: Niobium Target
|
Gd: Gadolinium Target
|
V: Vanadium Target
|
|
Bi: Bismuth Target
|
Ni: Nickel Target
|
Hf: Hafnium Target
|
W: Tungsten Target
|
|
Co: Cobalt Target
|
Sb: Antimony Target
|
In: Indium Target
|
Y: Yttrium Target
|
|
Cr: Chromium Target
|
Sn: Tin Target
|
Mg: Magnesium Target
|
Zr: Zirconium Target
|
|
Cu: Copper Target
|
Sr: Strontium Target
|
Mn: Manganese Target
|
|
|
Er: Erbium Target
|
Ta: Tantalum Target
|
|
|
Chromium Sputtering target Dimensions
| Shape of treated product | Diameter, mm | Thickness, mm | Width, mm | Length, mm |
| Plate | – | From 5 to 50 | Up to 1400 | Up to 1700 |
| Disc, ring | From 65 to 400 | From 5 to 50 | – | – |
| Rod, cylinder | From 15 to 65 | – | – | Up to 600 |
Other compound sputtering targets
|
Product Name
|
molecular formula
|
Purity
|
Rotating
Shape Plate
Shape Customized
|
|
Rhenium Target
|
Re
|
4N-5N
|
|
|
Vanadium target
|
V
|
3N-4N
|
|
|
niobium target
|
Nb
|
3N-4N
|
|
|
Titanium target
|
Ti
|
2N5-4N
|
|
|
Chromium target
|
Cr
|
2N5-4N
|
|
|
Copper target
|
Cu
|
3N-5N
|
|
|
Aluminum target
|
Al
|
2N5-4N
|
|
|
Ruthenium target
|
Ru
|
3N-4N
|
|
|
Iridium target
|
Ir
|
3N-4N
|
|
|
Rhodium target
|
Rh
|
4N
|
Quality Standard (99.95% Cr)
|
Element |
Value(≤ppm) |
Element |
Value(≤ppm) |
|
Fe |
5 |
Al |
2 |
|
Cu |
2 |
P |
2 |
|
Pb |
3 |
Si |
4 |
|
C |
4 |
S |
15 |
|
O |
42 |
N |
1 |
|
|
buy any quantity Chromium Metal Sputtering Targets For Pvd Coating at best price in mumbai, india.
All india metal corporation is an ISO certified stockist and supplier of Chromium Oxide Sputtering Target with a wide product range, Reliable Traders, Exporters and Effective Sourcing. 35 Years of Experience of manufacturing Rotatable Chromium Sputting Target
| Brands | Cr, %, minimum |
Impurities, ppm, maximum | ||||||||
| O | N | C | S | Fe | Si | Ni | Al | Cu | ||
| ERCr 99.9-PM | 99.9 | 350 | 100 | 200 | 30 | 500 | 100 | 100 | 70 | 40 |
| ERCr 99.95-PM | 99.95 | 200 | 50 | 100 | 20 | 250 | 50 | 40 | 30 | 30 |
| ERCr 99.97-PM | 99.97 | 100 | 50 | 70 | 20 | 100 | 20 | 10 | 20 | 20 |
| ∑ of metallic impurities Al, Fe, Cu, Ni, Si, Ca, K, Li, Mg, Mn, Mo, Na, Pb, Ti, W, Zn and others 300 ppm, maximum | ||||||||||
| ERCr 99.99-PM | 99.99 | 100 | 50 | 70 | 20 | 50 | 10 | 5 | 5 | 10 |
| ∑ of metallic impurities Al, Fe, Cu, Ni, Si, Ca, K, Li, Mg, Mn, Mo, Na, Pb, Ti, W, Zn and others 100 ppm, maximum | ||||||||||
| Linear Formula | Cr |
|---|---|
| MDL Number | MFCD00010944 |
| EC No. | 231-157-5 |
| Beilstein Registry No. | N/A |
| Pubchem CID | 23976 |
| SMILES | [Cr] |
| InchI Identifier | InChI=1S/Cr |
| InchI Key | VYZAMTAEIAYCRO-UHFFFAOYSA-N |
high purity Chromium sputtering target
|
2N5 Trace elements PPM ≥7.19 g/cm3
|
|||||||||
|
Chemistry
|
Fe
|
Al
|
Si
|
Cu
|
Pb
|
C
|
S
|
O
|
N
|
|
Standard
|
≤1500
|
≤1200
|
≤1500
|
≤30
|
≤30
|
≤100
|
≤50
|
≤1000
|
≤100
|
|
Test Value
|
1300
|
700
|
1000
|
20
|
3
|
60
|
7
|
900
|
60
|
|
2N8 Trace elements PPM ≥7.19 g/cm3
|
|||||||||
|
Chemistry
|
Fe
|
Al
|
Si
|
Cu
|
Pb
|
C
|
S
|
O
|
N
|
|
Standard
|
≤1200
|
≤100
|
≤200
|
≤30
|
≤30
|
≤300
|
≤50
|
≤800
|
≤100
|
|
Test Value
|
1000
|
10
|
30
|
10
|
10
|
200
|
30
|
600
|
45
|
Chromium Sputtering Target Packaging
- Vacuum sealed package inside, then wrapped with bubble and loaded to carton outside.
Delivery
|
Shipping way
|
Time |
Notes |
|
EMS |
7-10 days |
Sample delivery |
|
DHL,Fedex,TNT,UPS |
7-10 days |
For your choice |
|
By Air |
7-10 days |
25-100KG |
|
By Sea |
25-30 days |
Sometimes need more than 30days |
- Chromium Sputtering Target widely used For producing electric light source parts and electric vacuum components.
- Chromium Oxide (Cr2o3) Sputtering Target used For producing medical laboratory equipment.
- Nickel Chromium Alloy Sputtering Target Used in the manufacture of weapons.
- Chromium Cobalt Alloy Sputtering TargetUsed as electrodes in the field of rare earth industry.
- Rotatable Chromium Sputting Target used for PVD (physical vapor deposition) and CVD (chemical vapor) deposition display
- Chromium Aluminum Sputtering Target Used to make decorations and etc.
- Chromium Sputtering Target used For producing heating elements and refractory parts in high temperature furnaces.
