Silicon Sputtering Target Suppliers In India
Monocrystalline Silicon sputtering target, Silicon Nitride Sputtering Target manufacturers
buy polycrystalline silicon sputtering target, Silicon Carbide Sputtering Target at lowest price
Silicon Sputtering Target suppliers in india
Silicon Nitride Sputtering Target
Silicon Carbide Sputtering Target
Are you looking to buy Silicon Nitride Sputtering Target from Silicon Sputtering Target Suppliers In India, Canada, USA, Australia, Canada, UK, Houston, Singapore, South Africa or Indonesia?
Table of Content
Check latest Silicon Sputtering Target price , Silicon Sputtering Target Manufacturers In india, Request a free sample of Rotatable Silicon Sputtering Target
| Molecular Weight | 28.08 |
|---|---|
| Appearance | Silvery |
| Melting Point | 1414 °C |
| Boiling Point | 2900 °C |
| Density | 2330 kg/m3 |
| Solubility in H2O | N/A |
| Electrical Resistivity | 3-4 microhm-cm @ 0°C |
| Electronegativity | 1.8 Paulings |
| Heat of Vaporization | 40.6 K-Cal/gm atom at 2355 °C |
| Poisson’s Ratio | 0.064 – 0.28 |
| Specific Heat | 0.168 Cal/g/K @ 25°C |
| Tensile Strength | N/A |
| Thermal Conductivity | 1.49 W/cm/K @ 298.2 K |
| Thermal Expansion | (25 °C) 2.6 µm·m-1·K-1 |
| Vickers Hardness | N/A |
| Young’s Modulus | 51-80 GPa |
We can supply Silicon Dioxide Sputtering Target to meet customer specific requirements.
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Doping
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P- Type
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N-type
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Intrinsic
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Orientation
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(100)
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Any orientation are available on request
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Resistivity
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10-50 ohm/cm
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Any resistivity are available on request
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Diameter
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from 10 to 150mm
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Thickness
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from 0.5mm up to 10 mm
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Surface
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Simply etched
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Top side optical polished
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Quality
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Inspection, cleaned for use in vacuum
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| Signal Word | N/A |
|---|---|
| Hazard Statements | N/A |
| Hazard Codes | N/A |
| Precautionary Statements | P312 |
| Flash Point | Not applicable |
| Risk Codes | N/A |
| Safety Statements | N/A |
| RTECS Number | VW0400000 |
| Transport Information | NONH |
| WGK Germany | 2 |
|
Silicon Sputtering Target |
Price
|
| Manufacturer of high purity Silicon sputtering target with better price | ₹ 71.07-₹ 71,066.40 / Piece |
| High purity Silicon Carbide (SiC) Sputtering Targets | ₹ 10,659.96-₹ 21,319.92 / Piece |
| High purity Silicon Carbide (SiC) Sputtering Targets | ₹ 10,659.96-₹ 21,319.92 / Piece |
| High Purity Sputtering Si Target Silicon Target | ₹ 36,954.53 / Pieces |
| 99.999% Monocrystalline Silicon Si sputtering target | ₹ 3,553.32-₹ 7,106.64 / Piece |
| High purity 99.999% Silicon sputtering target | ₹ 1,421.33-₹ 7,106.64 / Piece |
| Sputtering target 99.9% Silicon Carbide SiC target | ₹ 10,659.96-₹ 21,319.92 / Piece |
| Silicon Carbide 99.9% SiC Sputtering target for ceramic | ₹ 10,659.96-₹ 21,319.92 / Piece |
| high purity SiC silicon carbide Carborundum sputtering target | ₹ 3,553.32-₹ 7,106.64 / Piece |
| High pure 99.9% Silicon Carbide SiC Sputtering Target for Vacuum Coating | ₹ 3,553.32-₹ 7,106.64 / Piece |
| Special shape high purity polycrystalline mono silicon sputtering target | ₹ 710.67-₹ 1,421.33 / Piece |
Please note this is an approx Silicon Sputtering Target price in India. For final Silicon Carbide Sputtering Target price list please mail us.
High Purity Silicon Sputtering Target
Silicon Nitride Sputtering Target
Silicon Carbide Sputtering Target
Silicon Dioxide Sputtering Target
Monocrystalline Silicon Sputtering Target
Silicon Rotatable Sputtering Target
Polycrystalline Silicon Sputtering Target
Silicon Aluminum Sputtering Target
| SI009210 | Silicon Sputtering Target, Thickness:6.4mm, Purity:99.999%, Electrical type:N-Type |
| SI009211 | Silicon Sputtering Target, Thickness:6.4mm, Purity:99.999%, Electrical type:P-type |
| SI009300 | Silicon Sputtering Target, Thickness:3.0mm, Purity:99.999% |
| SI009400 | Silicon Sputtering Target, Thickness:4.0mm, Purity:99.999% |
| SI009500 | Silicon Sputtering Target, Thickness:5.0mm, Purity:99.999% |
| SI009600 | Silicon Sputtering Target, Thickness:6.0mm, Purity:99.999% |
A leading wholesale dealers & distributor of Polycrystalline Silicon Sputtering Target in India offer these Silicon Sputtering Target as per Customer specification. Suppliers & exporter of mill condition Silicon Aluminum Sputtering Target for general applications.
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Material Type
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Silicon
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Symbol
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Si
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Composition
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Si
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Purity
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>99.9%
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Color/Apperance
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Gray
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Density
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>2.2g/cm3(>95%)
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Molding process
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Straight pull/Casting
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Resisitivity(20℃)
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<20ohm.cm
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Maximum Impurities
Content Unit:PPM
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Fe:0.5
Li:0.5
Na:0.5
Zn:0.5
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Cu:0.5
Al:0.5
Mg:0.5
Ni:0.5
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Ag: 0.5
Pb:0.5
Mo:0.5
B:0.5
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Formula
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Name
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Purity
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Formula
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Name
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Purity
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Al
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Aluminum Target
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5N-5N5
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Nb
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Niobium Target
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3N5-4N
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B
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Boron Target
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3N
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Ni
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Nickel Target
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3N5-5N
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Bi
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Bismuth Target
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4N-5N
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NiCr
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Nickel Chromium
|
3N 3N5
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Ca
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Calcium Target
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2N5
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Pb
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Plumbum Target
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5N
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Cd
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Cadmium Target
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4N
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Sb
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Antimony Target
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4N
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Co
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Cobalt Target
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3N5
|
Se
|
Selenium Target
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4N
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Cr
|
Chromium Target
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2N5-3N5
|
Si
|
Silicon Target
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5N
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CrAl
|
Chromium Aluminum
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3N
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Sn
|
Tin Target
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4N
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Cu
|
Copper Target
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4N-6N
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Ta
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Tantalum Target
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3N5-4N
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Fe
|
Iron Target
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3N5
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Te
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Tellurium Target
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4N
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Ge
|
Germanium Target
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5N
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Ti
|
Titanium Target
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2N5-5N
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Hf
|
Hafnium Target
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3N5
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TiAl
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Titanium Aluminum
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3N
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In
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Indium Target
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4N5
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V
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Vanadium Target
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3N
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Li
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Lithium Target
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3N
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W
|
Tungsten Target
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3N5-5N
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Mg
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Magnesium Target
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3N5-4N
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WTi
|
Tungsten Titanium
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3N-4N
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Mn
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Manganese Target
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3N
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Zn
|
Zinc Target
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4N5
|
|
Mo
|
Molybdenum Target
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3N5-4N
|
Zr
|
Zirconium Target
|
2N5-3N5
|
Advantages of silicon targets from Allindia Metal
- Planer type and cylindrical type are available
- Provide low resistance type with DC sputtering capability
- Choice from single crystal silicon, columnar silicon and polycrystalline silicon
- Available up to 500mm diameter
- Prevent cracks while sputtering
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Name
|
Purity
|
Form
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|
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Silicon |
Si |
99.999% |
Sputtering Targets, Boat, Crystal, Wafer, Disk, Plate, Sheet, Tube, Evaporation Material, Powder |
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Name
|
Purity
|
Form
|
|
|
Aluminum Silicon Alloy |
AlSi Alloy |
AlSi 99/1, 90/ 10 |
Ingots, Sputtering Target, Granule, Discs, Plates, Sheets, Circle |
|
Aluminum Magnesium Silicon Alloy |
AlMgSi Alloy |
AL-Mg-Si |
Ingots |
|
Aluminum Niobium Silicon Alloy |
AlNbSi Alloy |
AlNbSi 46/52/2 |
Granules, Powders |
|
Chromium Silicon Alloy |
CrSi Alloy |
96%-99% |
Powder(40-300mesh) |
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Copper Silicon Alloy |
CuSi Alloy |
CuSi 90/10, 85/15 |
Broken ingots |
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Copper Silicon Alloy |
CuSi Alloy |
CuSi 80/20, 70/30 |
Broken ingots |
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Iron Silicon Zirconium Alloy |
FeSiZr Alloy |
FeSiZr |
Lumps |
|
Iron Silicon Manganese Aluminum Alloy |
FeSiMnAl Alloy |
FeSiMnAl 40/20/20/20 |
Lumps |
|
Nickel Magnesium Silicon Iron Alloy |
NiMgSiFe Alloy |
NiMgSiFe 47/16/20 |
Lumps |
|
Nickel Magnesium Silicon Iron Alloy |
NiMgSiFe Alloy |
NiMgSiFe 60/16/6 |
Lumps |
|
Nickel Magnesium Silicon Iron Alloy |
NiMgSiFe Alloy |
Ni-Mg-SiFe 60/16/6 |
Lumps |
|
Nickel Magnesium Iron Silicon Cerium Alloy |
NiMgFeSiCe Alloy |
NiMgFeSi 65/15/15/5 |
Lumps |
|
Nickel Magnesium Iron Silicon Cerium Alloy |
NiMgFeSiCe Alloy |
NiMgFeSi 50/15/15/20 |
Lumps |
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Silicon Titanium Alloy |
SiTi Alloy |
Si-Ti 53/47 |
Powders |
|
Silicon Manganese Alloy |
SiMn Alloy |
Custom-made |
powders |
|
Zirconium Silicon Alloy |
ZrSi Alloy |
Custom -made |
Powders |
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Name
|
Sign
|
Purity
|
Character
|
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Chromium Silicide |
Cr3Si |
99.99%, 99.5% |
Sputtering Target, Evaporation Material, Substrate, Granule, Discs, Plates, Sheets, Circle, Powders(40-300mesh) |
|
Chromium Silicide |
CrSi2 |
99.99%, 99.5% |
Sputtering Target, Evaporation Material, Substrate, Granule, Discs, Plates, Sheets, Circle, Powders(40-300mesh) |
|
Hafnium Silicide |
HfSi2 |
99.99%, 99.5% |
Sputtering Target, Evaporation Material, Substrate, Granule, Discs, Plates, Sheets, Circle, Powders(40-300mesh) |
|
Magnesium Silicide |
Mg2Si |
99.99%,99.999% |
Powder, lump, chunk |
|
Molybdenum Silicon |
MoSi2 |
99.99%, 99.5% |
Sputtering Target, Evaporation Material, Substrate, Granule, Discs, Plates, Sheets, Circle, Powders(40-300mesh) |
|
Niobium Silicide |
NbSi2 |
99.99%, 99.5% |
Sputtering Target, Evaporation Material, Substrate, Granule, Discs, Plates, Sheets, Circle, Powders(40-300mesh) |
|
Silicon Carbide |
SiC |
99.99%, 99.5% |
Sputtering Target, Granule, Discs, Plates, Sheets, Circle, Pellet, Nanometer Powder, Powders(40-300mesh) |
|
Silicon Dioxide |
SiO2 |
99.99%, 99.5% |
Sputtering Target, Evaporation Material, Substrate, Wafer, Granule, Discs, Plates, Sheets, Circle, Pellet |
|
Silicon Monoxide |
SiO |
99.99%, 99.5% |
Sputtering Target, Evaporation Material, Granule, Discs, Plates, Sheets, Circle, Pellet |
|
Silicon Nitride |
Si3N4 |
99.99%, 99.5% |
Sputtering Target, Evaporation Material, Granule, Discs, Plates, Sheets, Pellet, Nanometer Powder, Powders(40-300mesh) |
|
Tantalum Silicide |
TaSi2 |
99.99%, 99.5% |
Sputtering Target, Evaporation Material, Substrate, Granule, Discs, Plates, Sheets, Circle, Powders(40-300mesh) |
|
Tantalum Silicide |
Ta5Si3 |
99.99%, 99.5% |
Sputtering Target, Evaporation Material, Substrate, Granule, Discs, Plates, Sheets, Circle, Powders(40-300mesh) |
|
Titanium Silicide |
TiSi2 |
99.99%, 99.5% |
Sputtering Target, Evaporation Material, Substrate, Granule, Discs, Plates, Sheets, Circle, Powders(40-300mesh) |
|
Titanium Silicide |
Ti5Si3 |
99.99%, 99.5% |
Sputtering Target, Evaporation Material, Substrate, Granule, Discs, Plates, Sheets, Circle, Powders(40-300mesh) |
|
Tungsten Silicide |
WSi2 |
99.99%, 99.5% |
Sputtering Target, Evaporation Material, Substrate, Granule, Discs, Plates, Sheets, Circle, Powders(40-300mesh) |
|
Vanadium Silicide |
V3Si |
99.5% |
Sputtering Target, Evaporation Material, Substrate, Granule, Discs, Plates, Sheets, Circle, Powders(40-300mesh) |
|
Vanadium Silicide |
VSi2 |
99.5% |
Sputtering Target, Evaporation Material, Substrate, Granule, Discs, Plates, Sheets, Circle, Powders(40-300mesh) |
|
Zirconium Silicon |
ZrSi2 |
99.9% |
Sputtering Target, Evaporation Material, Substrate, Granule, Discs, Plates, Sheets, Circle, Powders |
|
|
buy any quantity Rotatable Silicon sputtering target, Silicon Dioxide Sputtering Target at best price in mumbai, india.
All india metal corporation is an ISO certified stockist and supplier of Monocrystalline Silicon Sputtering Target with a wide product range, Reliable Traders, Exporters and Effective Sourcing. 35 Years of Experience of manufacturing Rotatable Silicon Sputtering Target
| Linear Formula | Si |
|---|---|
| MDL Number | MFCD00085311 |
| EC No. | 231-130-8 |
| Beilstein Registry No. | N/A |
| Pubchem CID | 5461123 |
| SMILES | [Si] |
| InchI Identifier | InChI=1S/Si |
| InchI Key | XUIMIQQOPSSXEZ-UHFFFAOYSA-N |
- Vacuum sealed package inside, then wrapped with bubble and loaded to carton outside.
|
Shipping way
|
Time |
Notes |
|
EMS |
7-10 days |
Sample delivery |
|
DHL,Fedex,TNT,UPS |
7-10 days |
For your choice |
|
By Air |
7-10 days |
25-100KG |
|
By Sea |
25-30 days |
Sometimes need more than 30days |
- Silicon Sputtering Target widely used in Defense
- Silicon Nitride Sputtering Target used for Pigments & Coatings
- Silicon Carbide Sputtering Target used for Thin Film Deposition
- Silicon Dioxide Sputtering Target used for Solar Energy
- Silicon Nitride Sputtering Target used for High Purity Materials
- Silicon Sputtering Target used for Research & Laboratory
